Subchapter 21 - ANALYTICAL X-RAY INSTALLATIONS
- Section 7:28-21.1 - Scope
- Section 7:28-21.2 - Definitions
- Section 7:28-21.3 - General equipment requirements
- Section 7:28-21.4 - Additional equipment requirements for open beam x-ray systems
- Section 7:28-21.5 - Additional equipment requirements for enclosed beam X-ray systems
- Section 7:28-21.6 - Operating procedures
- Section 7:28-21.7 - Analytical x-ray equipment with a high voltage supply that cannot operate at potentials above 16 kilovolts