where:
Ei = Annual production process emissions of input gas i for threshold applicability purposes (metric tons CO2e).
S = 100 percent of annual manufacturing capacity of a facility as calculated using Equation I-5 of this subpart (m2).
EFi = Emission factor for input gas i (kg/m2).
GWPi = Gas-appropriate GWP as provided in Table A-1 to subpart A of this part.
0.001 = Conversion factor from kg to metric tons.
i = Input gas.
where:
Ei = Annual production process emissions of input gas i for threshold applicability purposes (metric tons Co2e).
S = 100 percent of annual manufacturing capacity of a facility as calculated using Equation I-5 of this subpart (m2).
EFi = Emission factor for input gas i (g/m2).
GWPi = Gas-appropriate GWP as provided in Table A-1 to subpart A of this part.
0.000001 = Conversion factor from g to metric tons.
i = Input gas.
where:
Ei = Annual production process emissions of input gas i for threshold applicability purposes (metric tons Co2e).
Ci = Annual fluorinated GHG (input gas i) purchases or consumption (kg). Only gases that are used in PV manufacturing processes listed at § 98.90(a)(1) through (a)(4) that have listed GWP values in Table A-1 to subpart A of this part must be considered for threshold applicability purposes.
GWPi = Gas-appropriate GWP as provided in Table A-1 to subpart A of this part.
0.001 = Conversion factor from kg to metric tons.
i = Input gas.
where:
ET = Annual production process emissions of all fluorinated GHGs for threshold applicability purposes (metric tons Co2e).
[DELTA] = Factor accounting for fluorinated heat transfer fluid emissions, estimated as 10 percent of total annual production process emissions at a semiconductor facility. Set equal to 1.1 when Equation I-4 of this subpart is used to calculate total annual production process emissions from semiconductor manufacturing. Set equal to 1 when Equation I-4 of this subpart is used to calculate total annual production process emissions from MEMS, LCD, or PV manufacturing.
Ei = Annual production process emissions of input gas i for threshold applicability purposes (metric tons Co2e), as calculated in Equations I-1, I-2 or I-3 of this subpart.
i = Input gas.
where:
S = 100 percent of annual manufacturing capacity of a facility (m2).
WX = Maximum substrate starts of fab f in month x (m2 per month).
x = Month.
40 C.F.R. §98.91