Ex Parte Letz et alDownload PDFPatent Trial and Appeal BoardMay 9, 201411750567 (P.T.A.B. May. 9, 2014) Copy Citation UNITED STATES PATENT AND TRADEMARKOFFICE UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www.uspto.gov APPLICATION NO. FILING DATE FIRST NAMED INVENTOR ATTORNEY DOCKET NO. CONFIRMATION NO. 11/750,567 05/18/2007 Tobias Letz 2000.144900/DE0797 1315 92585 7590 05/09/2014 Advanced Micro Devices, Inc. c/o Williams, Morgan & Amerson, P.C. 10333 Richmond, Suite 1100 Houston, TX 77042 EXAMINER PARKER, ALLEN L ART UNIT PAPER NUMBER 2892 MAIL DATE DELIVERY MODE 05/09/2014 PAPER Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE ____________________ BEFORE THE PATENT TRIAL AND APPEAL BOARD ____________________ Ex parte TOBIAS LETZ, MATTHIAS LEHR, JOERG HOHAGE, and FRANK KUECHENMEISTER ____________________ Appeal 2012-002956 Application 11/750,567 Technology Center 2800 ____________________ Before ADRIENE LEPIANE HANLON, CATHERINE Q. TIMM, and JAMES C. HOUSEL, Administrative Patent Judges. PER CURIAM. DECISION ON APPEAL Appellants seek review of the Examiner’s decision to reject claims 1- 3, 5-15, and 21. We have jurisdiction under 35 U.S.C. §§ 6(b) and 134(a). We reverse for the reasons stated by Appellants in their briefs and add the following primarily for emphasis. Appeal 2012-002956 Application 11/750,567 2 Appellants’ claims are directed to a method for forming integrated circuits and, specifically, to a technique for forming a passivation layer without a terminal metal. Claims 1 and 10 are the only independent claims. Claim 1 requires steps of determining the nitrogen content of a surface of a passivation layer of a device in which the passivation layer has been subject to a process of patterning an aluminum-based terminal metal layer stack formed thereon, determining a target range for nitrogen content based on the nitrogen content, and forming a second passivation layer in a second device having a second nitrogen content within the target range. Claim 10 requires steps of determining the concentration of nitrogen in a surface portion of a passivation layer after patterning an aluminum- based metal layer stack formed thereon, and forming a second passivation layer on a second device that does not comprise an aluminum-based terminal metal layer stack formed thereon, and reducing a concentration of nitrogen in a surface portion of said second passivation layer to a concentration range based on said determined concentration of nitrogen in said surface portion of said first passivation layer subjected to said patterning process. We need only concern ourselves with the rejection of the two independent claims. The Examiner rejects claim 1 under 35 U.S.C. § 103(a) as obvious over Shroff1 in view of Morken2 and as evidenced by referenceforbusiness.com3 and customplushtoys.com.4 The Examiner rejects claim 10 under 35 U.S.C. § 103(a) as obvious over Shroff in view of 1 US 6,500,750 B1 issued Dec. 31, 2002. 2 US 6,657,707 B1 issued Dec. 2, 2003. 3 ENCYCLOPEDIA OF SMALL BUSINESS, http://www.referenceforbusiness.com/small/Op-Qu/Prototype.html (last visited Oct. 22, 2010). 4 CUSTOM PLUSH TOYS, Step by Step, http://www.customplushtoys.com/step.shtml (last visited Oct. 22, 2010). Appeal 2012-002956 Application 11/750,567 3 Verhaegh5 and Morken and as evidenced by referenceforbusiness.com and customplushtoys.com. The Examiner further rejects claim 10 as obvious over Kao6 in view of Verhaegh and as evidenced by referenceforbusiness.com and customplushtoys.com. All of the rejections rely upon the referenceforbusiness.com and customplushtoys.com website documents as evidence that it was known in the art to make copies of a prototype/template, and manufacture a plurality of devices based on the template, i.e., what the Examiner calls a process of research and development, to support the conclusion that it would have been obvious to one of ordinary skill in the art to have followed the sequence of steps of claims 1 and 10 to produce a prototype (Ans. 8-12, 20-24, and 29- 32). While we agree with the Examiner that it is generally known to manufacture prototypes and make copies of devices, we also agree with Appellants that the general concept of forming prototypes would not have suggested the specific steps of Appellants’ claimed process to one of ordinary skill in the art. The steps of claims 1 and 10 involve more than merely recreating a method used to form a first device to form a second device with the associated conventional process control and testing. Rather, the steps involve forming a second device with a passivation layer surface having a different history of processing. The second passivation layer has no history of being subject to patterning of an aluminum-based terminal layer stack, but the second passivation layer surface has a nitrogen content based on the nitrogen content of a first passivation layer that has been 5 US 6,198,155 B1 issued Mar. 6, 2001. 6 US 6, 249,044 B1 issued June 19, 2001. Appeal 2012-002956 Application 11/750,567 4 subjected to a patterning an aluminum-based terminal metal layer stack. This is not merely a process of copying the first device. REVERSED bar Copy with citationCopy as parenthetical citation