Ex Parte Keigler et alDownload PDFPatent Trial and Appeal BoardDec 30, 201612755198 (P.T.A.B. Dec. 30, 2016) Copy Citation United States Patent and Trademark Office UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O.Box 1450 Alexandria, Virginia 22313-1450 www.uspto.gov APPLICATION NO. FILING DATE FIRST NAMED INVENTOR ATTORNEY DOCKET NO. CONFIRMATION NO. 12/755,198 04/06/2010 Arthur Keigler 4088-0107 8151 6449 7590 01/04/2017 ROTHWELL, FIGG, ERNST & MANBECK, P.C. 607 14th Street, N.W. SUITE 800 WASHINGTON, DC 20005 EXAMINER CHUNG, HO-SUNG ART UNIT PAPER NUMBER 1754 NOTIFICATION DATE DELIVERY MODE 01/04/2017 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address(es): PTO-PAT-Email @rfem. com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte ARTHUR KEIGLER, JOHANNES CHIU, ZHENQIU LIU, and DANIEL GOODMAN Appeal 2015-000967 Application 12/755,198 Technology Center 1700 Before ADRIENE LEPIANE HANLON, KAREN M. HASTINGS, and GEORGE C. BEST, Administrative Patent Judges. BEST, Administrative Patent Judge. DECISION ON APPEAL The Examiner finally rejected claims 1, 4-15, 23-25, 27, 28, 30, and 31 of Application 12/755,198 under 35 U.S.C. § 103(a) as obvious. Final Act. (October 31, 2013). Appellants1 seek reversal of these rejections pursuant to 35 U.S.C. § 134(a). We have jurisdiction under 35 U.S.C. § 6. We heard oral argument in this appeal on December 9, 2016. For the reasons set forth below, we REVERSE. 1 Tel Nexx, Inc. is identified as the real party in interest. Appeal Br. 1. Appeal 2015-000967 Application 12/755,198 BACKGROUND The ’198 Application describes methods and apparatus for depositing a metal into micro-scale recesses in the surface of a substrate coated with a high resistivity metal film. Spec. 1. Such methods and apparatus may be used to create through-silicon-via structures for use in the fabrication of three dimensional electronic integrated devices. Id. Claim 25 is representative of the ’198 Application’s claims and is reproduced below from the Claims Appendix of the Appeal Brief: 25. A method for coating and filling the interior surfaces of microscale hole features fabricated into a surface of a workpiece, the method comprising: providing a workpiece with a barrier metal coating that is substantially continuous along the surface of the workpiece and the interior surfaces of the microscale hole features; providing a first conductive coating after the providing of the barrier metal coating, wherein the first conductive coating has a thickness of1000 angstroms or greater on a top surface of the workpiece and wherein the first conductive coating does not substantially coat the interior surfaces of the microscale hole features', providing a second conductive coating by electrodeposition, wherein the first conductive coating provides substantially uniform electrical conduction across the workpiece for electrodeposition of the second conductive coating, and wherein at least part of the second conductive coating is formed on and in contact with the first conductive coating, and further wherein the second conductive coating is deposited on interior surfaces of the microscale hole features directly on the barrier metal coating and provides a finish coating for subsequent filling of the microscale hole features; and filling the microscale hole features with a conductive metal. Appeal Br. 20 (emphasis added). 2 Appeal 2015-000967 Application 12/755,198 REJECTION After entry of the Final Action, Appellants canceled claims 1,4-15, 23, and 24. Appeal Br. 2. Thus, only claims 25, 27, 28, 30, and 31 remain pending in the ’198 Application. Id. These claims are subject to a single ground of rejection: 1. Claims 25, 27, 28, 30, and 31 are rejected under 35 U.S.C. § 103(a) as unpatentable over the combination of Cohen2 and Chen.3 Final Act. 2. DISCUSSION Claim 25 is directed to a method for coating and filling the interior surfaces of microscale hole features comprising, in relevant part, providing a first conductive coating on top of a barrier metal coating “wherein the first conductive coating does not substantially coat the interior surfaces of the microscale hole features.” See Appeal Br. 20 (claim 25). The Examiner found that Cohen describes a physical vapor deposition (PVD) process that meets these claim limitations. Final Act. 3—4 (citing Cohen col. 3,11. 34-37; Fig. 3). Because this finding is erroneous, we reverse. We begin, as we must, by considering the language of claim 25. See Oakley, Inc. v. Sunglass Hut Int 7, 316 F.3d 1331, 1339 (Fed. Cir. 2003) (explaining that an obviousness analysis requires comparison of the properly construed claims to the available prior art). In particular, we must construe the phrase “substantially coat” as it is used within the context of claim 25. 2 US 6,136,707, issued October 24, 2000. 3 US 2005/0173252 Al, published August 11, 2005. 3 Appeal 2015-000967 Application 12/755,198 During prosecution, the PTO gives the language of the proposed claims the broadest reasonable meaning of the words in their ordinary usage as they would be understood by one of ordinary skill in the art, taking into account any definitions or other enlightenment provided by the written description contained in the applicant’s specification. In re Morris, 127 F.3d 1048, 1054-55 (Fed. Cir. 1997). In this case, Appellants’ Specification does not demonstrate that the phrase “substantially coat” is to be given a specific definition. Thus, we begin by considering the broadest reasonable meaning of the phrase “substantially coat” in its ordinary usage. A pertinent ordinary meaning of the word “coat” is “to provide with a layer or covering of something.” See, e.g., define: coat - Google Search, Google, https://www.google.com/search?q=defme%3A+coat. A pertinent ordinary meaning of the word “substantially” is “to a great or significant extent.” define: substantially - Google Search, Google, https://www.google.com/search?q=define%3A+substantially; see also substantially - definition of substantially in English \ Oxford Dictionaries, Oxford Dictionaries, http://bit.ly/2hpCGfg (“to a great or significant extent”); substantially Definition in the Cambridge English Dictionary, Cambridge Dictionary, http://bit.ly/2h5erQU (“to a large degree”). We, therefore, conclude that the broadest reasonable interpretation of the phrase “substantially coat” is “to cover to a great or significant extent.” As shown in Figures 3 and 4 of Cohen, PVD layer 126 extends along the sidewalls and completely covers the bottom of the microscale hole. The Examiner places great weight on Cohen’s statement that “the non-conformal PVD techniques, while providing adequate thickness on the field, fail[ed] to provide continuous and complete step coverage inside very narrow openings 4 Appeal 2015-000967 Application 12/755,198 with large AR.” Cohen col. 3,11. 34-37. Based upon this statement, the Examiner found that Cohen’s PVD layer does not substantially coat the interior features of the microscale hole. Answer 18-20. We are not persuaded by the Examiner’s reasoning. Cohen describes the importance of having a continuous coating: “To ensure void-free copper filling, the seed layer inside the openings must completely cover the bottom and the sidewall surfaces inside the openings without discontinuities, or else there will be voids in the copper electrofill.” Cohen col. 3,11. 8-12 (emphasis added). In view of this teaching, Cohen’s statement that the PVD layer fails to provide continuous and complete coverage inside very narrow openings means that the PVD layer contains some number of imperfections. An imperfect coating layer, however, can still “cover [the interior features of the microscale hole] to a great or significant extent.” For the purpose of this opinion, we do not decide how imperfect a layer must be so that it no longer covers the interior features of the microscale hole to a great or significant extent. As shown in Figure 3, PVD layer 126 extends along the sides and completely covers the bottom of the microscale hole. Cohen further states that PVD processes also “result in substantial overhangs at the top comers of the openings.” Cohen col. 3,11. 37-38. In view of this description and Cohen’s emphasis on the need for the PVD layer to provide complete coverage without discontinuities, we determine that the examiner erred by finding that Cohen describes a PVD layer that does not cover the interior features of the microscale hole to a great or significant extent. 5 Appeal 2015-000967 Application 12/755,198 CONCLUSION For the reasons set forth above, we reverse the rejection of claims 25, 27,28, 30, and 31. REVERSED 6 Copy with citationCopy as parenthetical citation